微/纳米多层金刚石自支撑膜的制备及生长特性的研究

在30kW级直流电弧等离子喷射化学气相沉积装置下,采用Ar-H2-CH4混合气体,通过控制工艺参数,在钼衬底上分别制备了普通微米自支撑膜及多层金刚石自支撑膜并对其进行研究.结果显示,同普通微米膜相比,多层膜体是由微米晶金刚石层和纳米晶金刚石层组成,表面光滑,微米层与纳米层间具有相互嵌套式的界面;多层膜中各层膜体的内应力沿生长方向有明显变化,出现一个从压应力到拉应力变化的过程;在沉积过程中,随着层数变化,膜体的生长速率也发生相应的变化.

Deposition of Microcrystalline/Nanocrystalline Multilayered Free-standing Diamond Film and Investigation of Growth Peculiarities

The conventional microcrystalline free-standing diamond film and multilayer free-standing diamond film were prepared by controlling deposition parameters and using 30kW power DC arc plasma jet chemical vapor deposition equipment.The fed gases were a mixture of Ar,H2 and CH4.The results show that the multilayer diamond film with smooth surface consists of micro-crystal layers and nano-crystal layers,comparing with the conventional microcrystalline diamond film.The boundary between micro-crystal layer and nano-crystal layer is nested by each other.The internal stress in multilayer diamond film varies along the film growth direction,indicating a change of compressive to tensile stress in the film. Finally,we also find that the growth rate of the multilayer films varies with the number of layers.