Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth |
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| Authors: | Y.C. Lim T. Westerwalbesloh A. Aschentrup O. Wehmeyer G. Haindl U. Kleineberg U. Heinzmann |
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| Affiliation: | University of Bielefeld, Faculty of Physics, Universit?tsstr. 25, 33615 Bielefeld, Germany, DE
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| Abstract: | Our aim was to produce EUV multilayer mirrors with a small spectral bandwidth ΔE≤3 eV at 70 eV peak energy using UHV electron beam evaporation by varying the thickness ratio (Γ=) between the absorber layer and the bilayer. The deposition process was controlled by in situ soft X-ray reflectometry, and ion-beam polishing as well as substrate-heating methods were applied to reduce the interface roughness. The reflection properties of the Mo–Si multilayer mirrors prepared were characterized by hard and soft X-ray reflectometry and details of the multilayer structure were revealed from cross-sectional transmission electron microscopy. Received: 22 September 2000 / Accepted: 4 October 2000 / Published online: 30 November 2000 |
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| Keywords: | PACS: 68.65 41.50 42.65.ky |
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