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Factors affecting the superconductivity in the process of depositing Nd1.85Ce0.15CuO4-δ by the pulsed electron deposition technique
基金项目:Supported by the Key Project of Zhejiang Provincial Natural Science Foundation (Grant No. Z605131), the '100 Talents Project' of Chinese Academy of Sciences, the Creative Research Group of National Natural Science Foundation of China (Grant No. 60321001) and the National Natural Science Foundation of China (Grant No. 60571029)
摘    要:

关 键 词:pulsed electron deposition   Nd1.85Ce0.15CuO4-δfilm   superconductivity
收稿时间:2006-10-27
修稿时间:2006-12-04

Factors affecting the superconductivity in the process of depositing Nd1.85Ce0.15CuO4−δ by the pulsed electron deposition technique
Guo YanFeng,Chen LeiMing,Guo Xi,Li PeiGang,Lei Ming,Tang WeiHua. Factors affecting the superconductivity in the process of depositing Nd1.85Ce0.15CuO4−δ by the pulsed electron deposition technique[J]. Science in China(Physics Astronomy), 2007, 50(6): 747-752. DOI: 10.1007/s11433-007-0063-5
Authors:Guo YanFeng  Chen LeiMing  Guo Xi  Li PeiGang  Lei Ming  Tang WeiHua
Affiliation:(1) Department of Physics, Center for Optoelectronics Materials and Devices, Zhejiang Sci-Tech University, Hangzhou, 310018, China;(2) National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing, 100080, China;(3) Department of Mathematics and Physics, Zhengzhou Institute of Aeronautical Industry and Management, Zhengzhou, 450015, China
Abstract:On SrTiO3 single crystal substrate, by using the pulsed electron deposition technique, the high-quality electron doped Nd1.85Ce0.15CuO4−δ superconducting film was successfully fabricated. After careful study on the R-T curves of the obtained samples deposited with different substrate temperatures, thicknesses, annealing methods and pulse frequencies, the effects of them on the superconductivity of the films were found, and the reasons were also analyzed. Additionally, by using the same model of the pulsed laser deposition technique, the relation between the target-to-substrate distance and the deposition pressure was drawn out as a quantitative one. Supported by the Key Project of Zhejiang Provincial Natural Science Foundation (Grant No. Z605131), the ‘100 Talents Project’ of Chinese Academy of Sciences, the Creative Research Group of National Natural Science Foundation of China (Grant No. 60321001) and the National Natural Science Foundation of China (Grant No. 60571029)
Keywords:pulsed electron deposition  Nd1.85Ce0.15CuO4−  δ   film  superconductivity
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