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Attachment and ionization in a self-consistent treatment of the electron kinetics of a collision-dominated rf plasma
Authors:R Winkler  M Dilonardo  M Capitelli  J Wilhelm
Institution:(1) Zentralinstitut für Elektronenphysik, Institutsteil Greifswald, Akademie der Wissenschaften der DDR, Robert-Blum-Str. 8-10, 2200 Greifswald, GDR;(2) Centro di Studio per la chimica dei Plasmi del C.N.R. and Dipartimento di Chimica, Università di Bari, Via Amendola 173-70126, Bari, Italy
Abstract:This paper deals with the self-consistent determination of the rf field amplitude for sustaining the steady-state collision-dominated weakley ionized plasmas in the bulk of the rf discharge and of the time-resolved behavior of the isotropic part of the distribution function as well as of relevant macroscopic quantities in plasmas whose particle loss is dominantly determined by electron attachment. The strict timeresolved treatment is based on the nonstationary Boltzmann equation of the electrons and its numerical solution including, apart from electron number conservative collision processes, the electron attachment and ionization. The investigations are related to an rf plasma in a model gas and in SF6 and are performed for reduced rf field frequencies around 10 MHz Torr–1 which are of particular interest from the point of application of rf discharges for plasma processing. The numerical results show that a large field amplitude of around 160 V cm–1 Torr–1 is necessary to maintain the discharge and that the isotropic distribution, the relevant collision frequencies for attachment and ionization, and the electron density undergo a large modulation during a period of the rf field.
Keywords:rf plasma  electron kinetics  Boltzmann equation  electron energy distribution function
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