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Low field wall mobility in thin conducting ferromagnetic films |
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| Authors: | T.H. O&#x Dell |
| Affiliation: | Department of Electrical Engineering, Imperial College, University of London, London SW7 2BT, UK |
| Abstract: | The factors which may determine the low field domain wall mobility in thin ferromagnetic films of nickel iron are reconsidered in the light of recent experimental and theoretical work which has been published. |
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