Temperature and drain bias dependence of single event transient in 25-nm FinFET technology |
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Authors: | Qin Jun-Rui Chen Shu-Ming Li Da-Wei Liang Bin Liu Bi-Wei |
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Affiliation: | College of Computer, National University of Defense Technology, Changsha 410073, China |
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Abstract: | In this paper, we investigate the temperature and drain bias dependency of single event transient (SET) in 25-nm fin field-effect-transistor (FinFET) technology in a temperature range of 0-135 ℃ and supply voltage range of 0.4 V-1.6 V. Technology computer-aided design (TCAD) three-dimensional simulation results show that the drain current pulse duration increases from 0.6 ns to 3.4 ns when the temperature increases from 0 to 135 ℃. The charge collected increases from 45.5 fC to 436.9 fC and the voltage pulse width decreases from 0.54 ns to 0.18 ns when supply voltage increases from 0.4 V to 1.6 V. Furthermore, simulation results and the mechanism of temperature and bias dependency are discussed. |
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Keywords: | fin field-effect transistor single event transient temperature dependence drain bias dependence |
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