CVD modified KL zeolite supported Pt for n-hexane aromatization |
| |
Authors: | Jian Zheng Yuan Chun Jialu Dong Qinhua Xu |
| |
Affiliation: | Department of Chemistry, State Key Laboratory of Coordination Chemistry, Nanjing University, Nanjing 210093, PR China |
| |
Abstract: | Modification of non-acidic KL zeolite by chemical vapor deposition (CVD) of Si(OEt)4 and (CH3)3Si–O–Si(CH3)3 followed by Pt loading was used to study the influence of zeolite support on the aromatization of n-hexane. Deposited on the framework oxygen ions of the non-acidic zeolite, the silica layer effectively narrowed the pores of KL zeolite. But owing to the appearance of new basic sites, such as potassium oxide (K2O), the interaction between Pt metal and zeolite support was strengthened, causing Pt particles to be more electron-excess. n-Hexane pulse-flow microreactions were carried out to study the effects on the aromatization reactivity and sulfur poisoning properties. |
| |
Keywords: | Chemical vapor deposition Pt supported KL zeolite n-Hexane aromatization Sulfur resistance |
本文献已被 ScienceDirect 等数据库收录! |