Photodegradable physically cross‐linked polymer networks are prepared from self‐assembly of photolabile triblock copolymers. Linear triblock copolymers composed of poly (o‐nitrobenzyl methacrylate) and poly(ethylene glycol) (PEG) segments of variable molecular weights were synthesized using atom transfer radical polymerization. Triblock polymers with low‐molecular‐weight PEG segments form solid films upon hydration with robust mechanical properties including a Young's modulus of 76 ± 12 MPa and a toughness of 108 ± 31 kJ m?3. Triblock polymers with high‐molecular‐weight PEG segments form physically cross‐linked hydrogels at room temperature with a dynamic storage modulus of 13 ± 0.6 kPa and long‐term stability in hydrated environments. Both networks undergo photodegradation upon irradiation with long wave UV light.
