Effect of laser fluence on the deposition and hardnessof boron carbide thin films |
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Authors: | F Kokai M Taniwaki M Ishihara Y Koga |
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Institution: | (1) FCT Project, JFCC, c/o AIST, Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan, JP;(2) AIST, Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan, JP |
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Abstract: | We deposited amorphous thin films of boron carbide by pulsed laser deposition using a B4C target at room temperature. As the laser fluence increased from 1 to 3 J/cm2, the number of 0.25–5 μm particulates embedded in the films decreased, and the B/C atomic ratio of the films increased from
1.8 to 3.2. The arrival of melt droplets, atoms, and small molecular species depending on laser fluence appeared to be involved
in the film formation. In addition, with increasing fluence the nanoindentation hardness of the films increased from 14 to
32 GPa. We believe that the dominant factor in the observed increase in the films’ hardness is the arrival of highly energetic
ions and atoms that results in the formation of denser films.
Received: 23 March 2001 / Accepted: 1 July 2001 / Published online: 2 October 2001 |
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Keywords: | PACS: 62 20 Qp 81 05 Je 81 15 Fg |
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