Electrical transport properties of graphene-covered-Cu wires grown by chemical vapor deposition |
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Authors: | Kwonjae YooEK Seo SJ KimW Kim MG ParkH Yu Chanyong Hwang |
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Institution: | a Center for Nano-Imaging Technology, Korea Research Institute of Standards and Science, 267 Gajeong-Ro, Yuseong, Daejeon 305-340, Republic of Korea b Center for Nano-Bio Convergence, Korea Research Institute of Standards and Science, 267 Gajeong-Ro, Yuseong, Daejeon 305-340, Republic of Korea |
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Abstract: | We investigated the field-effect transistor (FET) characteristics of 15-μm graphene-covered copper wires (G-wires). Unlike the previously reported graphene FET, carries initially showed p-type like FET characteristics in two-terminal transport measurements. Our results indicate that the electrical transport processes in a G-wire FET occur in both the heavily p-doped contact and the p-doped radial graphene channel, as a p-channel. The interfacial potential barrier between the contact electrode and the radial graphene channel is small, but there is a radial potential barrier that limits electrical transport through the copper core in chemical vapor deposition (CVD) grown samples. The p-type FET characteristics appeared clearly after the oxidation of the G-wires. |
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Keywords: | Graphene Chemical vapor deposition Field-effect transistor Charge transfer doping |
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