The self-assembly of asymmetric block copolymers in films contacting a patterned surface |
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Authors: | I V Neratova A S Pavlov L A Tsar’kova P G Khalatur |
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Institution: | 1.Tver State University,Tver,Russia;2.Ulm University,Ulm,Germany;3.Lehrstuhl für Physikalische Chemie II,Universit?t Bayreuth,Bayreuth,Germany;4.Nesmeyanov Institute of Organoelement Compounds,Russian Academy of Sciences,Moscow,Russia |
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Abstract: | The preparation of ordered high-density polymer layers via the combined method of templated self-assembly is discussed. This
approach combines the advantages of guided self-assembly of block copolymers and lithography on a topographical or chemical
pattern. To implement the approach, a simulation has conducted for the first time through the use of the dissipative particle
dynamics method in the NPAT ensemble. The pattern replication by asymmetric copolymers that form cylindrical phases in the
bulk owing to their self-assembly near the patterned surface is studied. The effects of three patterns are described, i.e.,
hexagonal, rectangular, and triangular, which are characterized by one or two length scales. It is shown that the dense hexagonal
pattern and the sparse rectangular and triangular patterns induce vertically oriented cylindrical domains in a thin film.
The control of the orientation and ordering in the formed morphology heavily depends on the interaction between the minority
component and the pattern. This effect is global in nature: The surface pattern propagates into the bulk of a film. In the
case of rectangular and triangular patterns, two- and fourfold increases in their quantitites in the bulk are observed. |
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