湿法和溶脱法的亚微米ZnO:Al光栅制备

以激光干涉法得到的光刻胶图案为掩模，采用湿法刻蚀和溶脱-剥离法制备了具有良好减反射特性的亚微米掺铝氧化锌（ZnO:Al, AZO）光栅。表面形貌特征和反射光谱测试结果表明，湿法刻蚀较溶脱-剥离法得到的AZO光栅表面更为粗糙，两者均方根粗糙度分别为25.4，7.6 nm。在400～900 nm波段，两种方法制备的周期和高度相同的光栅，平均总反射率分别由AZO薄膜的12.5%下降到8.3%和10.2%。两者的平均镜面反射率分别为6.2%和6.6%，平均漫反射率分别为2.1%和3.6%。湿法刻蚀得到的表面较为粗糙AZO光栅的漫反射明显减弱，从而导致总的减反特性优于溶脱-剥离法得到的表面起伏相对较小的AZO光栅。

Farbrication of submicron ZnO:Al gratings with wet etching and lift-off technology

With a photoresist pattern acquired by laser interference lithography as an etch mask, submicron aluminum-doped zinc oxide (AZO) gratings, which had excellent anti-reflection properties, were acquired by using wet etching and lift-off technology. The surface morphology was observed by an atomic force microscopy (AFM), and the reflectance spectrum was tested with a ultra-visible spectrophotometer. Results show that the AZO grating fabricated by wet etching is rougher than that acquired by lift-off technology, and the root mean squares of surface topographies of the two gratings are 25.4 nm and 7.6 nm, respectively. In the waveband range of 400-900 nm, two structural AZO gratings with the same period (980 nm) and height (160 nm) decrease the average total reflectance from 12.5% of the AZO thin film to 8.3% and 10.2%, respectively. The average specular reflectance are 6.2% and 6.6%, and diffuse reflectance are 2.1% and 3.6%, accordingly. It is concluded that wet etching-made AZO grating with rough surfaces decrease diffuse reflectance greatly, and are better in decreasing total reflectance than lift-off-made AZO grating with flatter surfaces.