Field-electron emission from polyimide-ablated films |
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| Authors: | H Ma L Zhang N Yao Z Bi B Zhang H Hu |
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| Institution: | (1) Zhengzhou University of Technology, Zhengzhou 450002, P.R. China, CN;(2) Physics Department, Zhengzhou University, Zhengzhou 450052, P.R. China, CN;(3) Anhui Institute Optical and Fine Mechanical, Chinese Academy of Sciences, Hefei 230031, P.R. China, CN |
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| Abstract: | Polyimide-ablated film was deposited by using pulsed laser ablation of a polyimide target, and field-electron emission from
the film was observed for the first time. The turn-on field of the polyimide-ablated film is 12 V/μm. The current density
is 0.725 mA/cm2, and the emission sites density is on the order of 106/cm2 at the applied field of 24 V/μm. The field-electron emission measurements indicate that this kind of film could be a new
cold cathode material. It is suggested that the graphite-like clusters contained in the film play an important role in the
field-electron emission.
Received: 2 February 2000 / Accepted: 13 March 2000 / Published online: 9 August 2000 |
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| Keywords: | PACS: 68 55 Ng 79 70 +q 81 15 Fg |
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