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New directions in X-ray microscopy |
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| Authors: | Roger Falcone Chris Jacobsen Janos Kirz Stefano Marchesini David Shapiro John Spence |
| Institution: | 1. Advanced Light Source , Lawrence Berkeley National Laboratory , Berkeley, CA, USA;2. Department of Physics , University of California , Berkeley, CA, USA rwf@berkeley.edu;4. Argonne National Laboratory , Argonne, IL, USA;5. Northwestern University , Evanston, IL, USA;6. Advanced Light Source , Lawrence Berkeley National Laboratory , Berkeley, CA, USA;7. NSLS II , Brookhaven National Laboratory , Upton, NY, USA;8. Department of Physics , Arizona State University , Tempe, AZ, USA |
| Abstract: | The development of high brightness X-ray sources and high resolution X-ray optics has led to rapid advances in X-ray microscopy. Scanning microscopes and full-field instruments are in operation at synchrotron light sources worldwide, and provide spatial resolution routinely in the 25–50 nm range using zone plate focusing elements. X-ray microscopes can provide elemental maps and/or chemical sensitivity in samples that are too thick for electron microscopy. Lensless techniques, such as diffraction microscopy, holography and ptychography are also being developed. In high resolution imaging of radiation-sensitive material the effects of radiation damage needs to be carefully considered. This article is designed to provide an introduction to the current state and future prospects of X-ray microscopy for the non-expert. |
| Keywords: | X-ray microscopy X-ray diffraction X-ray optics phase-contrast |