Detection of C-Si covalent bond in CH3 adsorbate formed by chemical reaction of CH3MgBr and H:Si(111) |
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Authors: | Yamada Taro Inoue Tomoyuki Yamada Keiko Takano Nao Osaka Tetsuya Harada Hiroshi Nishiyama Katsuhiko Taniguchi Isao |
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Affiliation: | Kagami Memorial Laboratory for Materials Science and Technology, Waseda University, 2-8-26 Nishiwaseda, Shinjuku-ku, Tokyo 169-0051, Japan. tayamada@postman.riken.go.jp |
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Abstract: | High-resolution electron energy loss spectroscopy (HREELS) yielded evidence for the formation of single covalent bonds between Si(111) surface atoms and CH(3) groups from the reaction of CH(3)MgBr and hydrogen-terminated H:Si(111)(1 x 1). The vibration at 678 cm(-)(1), assigned to the C-Si bond, was isolated within the spectrum of CH(3) on deuterium-terminated D:Si(111)(1 x 1). The CH(3) groups were thermally stable at temperatures below 600 K. The C-Si bonds are essential for enhancing the usefulness of alkyl moieties, which will lead to a new prospective technology of nanoscale fabrication and biochemical application. |
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