1. Institute of Physics for Microstructures, Russian Academy of Sciences, Nizhni Novgorod, 603950, Russia 2. PhysTeX, Vaals, 6290 AB, Netherlands
Abstract:
The thermal stability of multilayer thin-film Mo/ZrSi2 and Mo/NbSi2 filters in the temperature range of 840–940°C upon long-term heating in vacuum is investigated. The filter transmittance is measured before and after current annealing and a layer-by-layer SIMS analysis of the structure is performed. Comparative testing shows that the Mo/NbSi2 structure is less thermostable at high thermal loads.