| 新型光刻技术研究进展 |
| |
| 引用本文： | 何立文,罗乐,孟钢,邵景珍,方晓东.新型光刻技术研究进展[J].激光技术,2019,43(1):30-37. |
| |
| 作者姓名： | 何立文 罗乐 孟钢 邵景珍 方晓东 |
| |
| 作者单位： | 合肥工业大学 电子科学与应用物理学院,合肥,230009;中国科学院 安徽光学精密机械研究所,合肥,230031 |
| |
| 摘 要： | 集成电路光刻作为传统光刻技术的典型代表,支撑着集成电路芯片的快速发展。新一代光刻技术具有工艺多样化、光刻精度高、光刻效率高的优点,在研发新型光电子器件、实现3维微纳结构、构建有序纳米孔通道等方面有很大的潜力。回顾了近些年来涌现的多种新型光刻技术,分析了各自的特征及在新型纳米电子、光子器件、能源、传感等领域中的应用。对未来光刻技术的发展方向进行了展望。
|
| 关 键 词： | 激光技术 光学制造 新型光刻技术 无掩模光刻 掩模光刻 微纳结构 |
| 收稿时间： | 2018-01-18 |
Recent progress of novel photolithography technologies |
| |
| HE Liwen,LUO Le,MENG Gang,SHAO Jingzhen,FANG Xiaodong.Recent progress of novel photolithography technologies[J].Laser Technology,2019,43(1):30-37. |
| |
| Authors: | HE Liwen LUO Le MENG Gang SHAO Jingzhen FANG Xiaodong |
| |
| Institution: | (School of Electronics and Applied Physics, Hefei University of Technology, Hefei 230009, China;Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Hefei 230031, China) |
| |
| Abstract: | Integrated circuit(IC) lithography, as a typical representative of traditional lithography technology, supports the rapid development of integrated circuit chips. The new generation of photolithography technology has the advantages of diverse technology, high precision and high efficiency. It has great potential in the development of optoelectronic devices, the realization of 3-D micro-nano structure, and the construction of the ordered nanoscale channels. A variety of new photolithography technologies in recent years have been reviewed. Their characteristics and their applications in nanoelectronics, photonic devices, energy, sensing and other fields have been analyzed. Finally, the development direction of lithography technology in the future is prospected. |
| |
| Keywords: | laser technique optical fabrication new lithography technology maskless lithography mask lithography micro-nano structure |
| 本文献已被 维普 万方数据 等数据库收录！ |
| 点击此处可从《激光技术》浏览原始摘要信息 |
| 点击此处可从《激光技术》下载免费的PDF全文 |
|
