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Threshold Conditions for Bulk Second-Order Nonlinearity and Near-Surf ace Second-Order Nonlinearity in Thermally Poled Infrasil Silica |
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| Authors: | |
| Institution: | (1) Department of Electrical Engineering, Faculty of Engineering, Kyushu Institute of Technology, 1-1, Sensuicho, Tobata, Kitakyushu 804-8550, Japan;(2) Department of Molecular and Material Sciences, Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, 6-1, Kasuga-koen, Kasuga 816-8580, Japan;(3) Present address: P. O. Box 40-004, Shanghai 200040, P. R. China |
| Abstract: | Generation of bulk second-order nonlinearity in silica glass requires higher poling temperature or longer poling time than that of near-surface second-order nonlinearity. The threshold conditions for initiating the bulk second-order nonlinearity are studied on Infrasil fused silica glass. The threshold poling time is strongly dependent on the poling temperature. The near-surface second-order nonlinearity is also studied, especially the dependence of thickness of the nonlinear layer on the poling temperature, poling voltage and poling time. Secondary-ion mass-spectroscopy measurement showed depletion of Na+ ions at the anodic surface. We assume there is an ionic wave during poling traveling from the anodic surface to generate the dipolar electric field that induces the near-surface second-order nonlinearity. |
| Keywords: | nonlinear optics second-harmonic generation optical glass ion conduction in glass amorphous physics solid surface |
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