Fabrication of pellicle beam splitters for optical bus application |
| |
Authors: | J S Yeo S Mathai M Tan and L King |
| |
Institution: | (1) Hewlett-Packard Company, 1000 N.E. Circle Blvd., Corvallis, OR 97330, USA;(2) Hewlett-Packard Company, 1501 Page Mill Road, Palo Alto, CA 94304, USA |
| |
Abstract: | The optical bus architecture for on-board applications requires a number of optical splitters with precise split ratios to
route part of the input signal. Since hollow metal waveguide provides well collimated beams with very small gap loss, it opens
the possibility of inserting discrete optical beam splitters (taps). The optical tap requires low excess loss, polarization
insensitivity, temperature stability, minimized walk-off of the propagating beam, and cost effective manufacturing. By benefiting
from the mature interference coating technology for polarization insensitivity and temperature stability, we design a pellicle
beam splitter based on a static microelec tro-mechanical system (MEMS) and develop processes to fabricate pellicle splitters
using wafer level bonding of silicon and glass substrates, with subsequent thinning to 20 μm. With the approaches described
in this paper, we have demonstrated optical beam splitters with excess loss of less than 0.17 dB that operate at a data rate
of 10 Gb/s showing a clean eye diagram while providing controlled split ratio and polarization insensitivity. We have demonstrated
a high yielding MEMS based silicon processing platform which has the potential to provide a cost effective manufacturing solution
for optical beam splitters. |
| |
Keywords: | PACS" target="_blank">PACS 42 79 Gn 42 79 Fm 42 79 Sz 42 79 Wc 42 82 Et |
本文献已被 SpringerLink 等数据库收录! |
|