A novel chemical synthesis and characterization of Mn3O4 thin films for supercapacitor application |
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| Authors: | DP Dubal RR Salunkhe CD Lokhande |
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| Institution: | a Thin Film Physics Laboratory, Department of Physics, Shivaji University, Kolhapur 416004 (M.S), India
b Photonic and Electronic Thin Film Laboratory, Department of Materials Science and Engineering, Chonnam National University, 300 Yongbong-Dong, Puk-Gu, Gwangju 500-757, South Korea |
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| Abstract: | Mn3O4 thin films have been prepared by novel chemical successive ionic layer adsorption and reaction (SILAR) method. Further these films were characterized for their structural, morphological and optical properties by means of X-ray diffraction (XRD), Fourier transform infrared spectrum (FTIR), field emission scanning electron microscopy (FESEM), wettability test and optical absorption studies. The XRD pattern showed that the Mn3O4 films exhibit tetragonal hausmannite structure. Formation of manganese oxide compound was confirmed from FTIR studies. The optical absorption showed existence of direct optical band gap of energy 2.30 eV. Mn3O4 film surface showed hydrophilic nature with water contact angle of 55°. The supercapacitive properties of Mn3O4 thin film investigated in 1 M Na2SO4 electrolyte showed maximum supercapacitance of 314 F g−1 at scan rate 5 mV s−1. |
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| Keywords: | Mn3O4 thin films SILAR Surface morphology Supercapacitor |
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