Reversible wettability of nanostructured ZnO thin films by sol-gel method |
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Authors: | Jianguo Lü ,Kai Huang,Jianbo Zhu,Xueping Song |
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Affiliation: | a School of Physics and Material Science, Anhui University, Hefei 230039, China b Department of Physics and Electronic Engineering, Hefei Normal University, Hefei 230061, China c Department of Mathematics & Physics, Anhui University of Architecture, Hefei 230601, China |
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Abstract: | Nanostructured ZnO thin films were deposited on Si(1 1 1) and quartz substrate by sol-gel method. The thin films were annealed at 673 K, 873 K, and 1073 K for 60 min. Microstructure, surface topography, and water contact angle of the thin films have been measured by X-ray diffractometer, atomic force microscopy, and water contact angle apparatus. XRD results showed that the ZnO thin films are polycrystalline with hexagonal wurtzite structure. AFM studies revealed that rms roughness changes from 2.3 nm to 7.4 nm and the grain size grow up continuously with increasing annealing temperature. Wettability results indicated that hydrophobicity of the un-irradiated ZnO thin films enhances with annealing temperature increase. The hydrophobic ZnO surfaces could be reversibly switched to hydrophilic by alternation of UV illumination and dark storage (thermal treatment). By studying the magnitude and the contact angle reduction rate of the light-induced process, the contribution of surface roughness is discussed. |
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Keywords: | ZnO Sol-gel Surface topography Reversible wettability Hydrophobicity |
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