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Diamond deposition on siliconized stainless steel |
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| Authors: | F. Á lvarez,M. Reinoso,H. Huck,M. Rosenbusch |
| Affiliation: | a Departamento de Física, Comisión Nacional de Energía Atómica, Avda. General Paz 1499, (B1650) Gral. San Martín, Pcia. Buenos Aires, Argentina b Instituto Sabato, Universidad Nacional de San Martín, Comisión Nacional de Energía Atómica, Avda. General Paz 1499, (B1650) Gral. San Martín, Pcia. Buenos Aires, Argentina c Escuela de Ciencia y Tecnología, Universidad Nacional de San Martín, Calle 78 N° 3901, (B1653) Villa Ballester, Pcia. Buenos Aires, Argentina d Consejo Nacional de Investigaciones Científicas y Técnicas, Rivadavia 1917, (1033) Buenos Aires, Argentina e Departamento Química de Reactores, GIDAT-GAEN-Comisión Nacional de Energía Atómica, Avda. General Paz 1499, (B1650) Gral. San Martín, Pcia. Buenos Aires, Argentina |
| Abstract: | Silicon diffusion layers in AISI 304 and AISI 316 type stainless steels were investigated as an alternative to surface barrier coatings for diamond film growth. Uniform 2 μm thick silicon rich interlayers were obtained by coating the surface of the steels with silicon and performing diffusion treatments at 800 °C. Adherent diamond films with low sp2 carbon content were deposited on the diffused silicon layers by a modified hot filament assisted chemical vapor deposition (HFCVD) method. Characterization of as-siliconized layers and diamond coatings was performed by energy dispersive X-ray analysis, scanning electron microscopy, X-ray diffraction and Raman spectroscopy. |
| Keywords: | Diamond HFCVD Siliconization Stainless steel |
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