| 相位错动强度叠加光刻法 |
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| 引用本文： | 喻洪麟. 相位错动强度叠加光刻法[J]. 光子学报, 1997, 26(8): 707-709 |
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| 作者姓名： | 喻洪麟 |
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| 作者单位： | 重庆大学光电精密机械研究所!重庆，630044 |
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| 基金项目： | 国家自然科学基金，863计划基金 |
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| 摘 要： | 本文提出一种新的光栅相位错动强度叠加光刻法.研制出了高质量的圆光栅,该方法同样适用于各种计量光栅的研制.
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| 关 键 词： | 光栅刻划 相位错动强度叠加 柱面“蜂窝”透镜 |
| 收稿时间： | 1996-11-29 |
PHASE DISLOCATION STRENGTH SUPERIMPOSED PHOTOLITHOGRAPHY |
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| Yu Honglin. PHASE DISLOCATION STRENGTH SUPERIMPOSED PHOTOLITHOGRAPHY[J]. Acta Photonica Sinica, 1997, 26(8): 707-709 |
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| Authors: | Yu Honglin |
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| Affiliation: | Institute of Optronic precision mechanics, Chongqing University, 630044 |
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| Abstract: | A new kind of grating phase dislocatien strength superimposed photolithography is presentedin this paper. The high quality of radial grating is developed,and all kinds of metrological grating canbe developed by this method. |
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| Keywords: | Grating photolithography Phase dislocation strength superimposure Cylindric honeycomb lens |
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