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Enhancing antireflection property of silicon through direct picosecond laser surface texturing
Abstract:Crystalline silicon was laser surface textured by picosecond pulsed laser to enhance its antireflection property. The influence of laser scan speed and number of passes in fabricating the uniform surface microtexture were evaluated. Surface texture so generated was investigated and a grid of spherical domes and cavities, with nanoripples in the order of incident laser wavelength spread over it was observed. Reflectivity of bare silicon was greater than 40% and was significantly reduced well below 2% upon laser texturing, over a wavelength range of 400 to 700 nm. Antireflecting surface is an essential requirement for more efficient performance of devices for optical and photovoltaic application.
Keywords:antireflection  laser  silicon  surface‐texturing
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