Liquid-phase epitaxy of Potassium Niobate

The possibility of potassium niobate films growing by means of liquid phase epitaxy technique was investigated. The physical and chemical analyses of K₂O-V₂O₅-Nb₂O₅ system were carried out. Corundum wafers with {1¯210} and {0001} orientations served as substrates. The grown films were 10–30 μm thick. The grown heterostructures had a sharp, phase boundary line substrate-film. Epitaxial layer perfection was investigated by X-ray and electronographic methods.