Sub-500-nm patterning of glass by nanosecond KrF excimer laser ablation |
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Authors: | J. Bekesi J. Meinertz P. Simon J. Ihlemann |
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Affiliation: | 1. Laser-Laboratorium G?ttingen e.V., Hans-Adolf-Krebs-Weg 1, 37077, G?ttingen, Germany
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Abstract: | The surface of flint glass of type F2 is patterned by nanosecond KrF excimer laser ablation. Strong UV absorption provides a comparatively low ablation threshold and precise ablation contours. By using a two-grating interferometer, periodic surface patterns with 330 nm period and 100 nm modulation depth are obtained. This method enables the fabrication of 7 mm×13 mm wide grating areas with perfectly aligned grooves without the need of high-precision sample positioning. By double exposure, crossed gratings with adjustable depths in the two orthogonal directions can be generated. |
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