Electron attachment rate constant measurement by photoemission electron attachment ion mobility spectrometry (PE-EA-IMS) |
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| Authors: | Desheng Su Wenqi Niu Sheng Liu Chengyin Shen Chaoqun Huang Hongmei Wang Haihe Jiang Yannan Chu |
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| Institution: | 1. University of Florida, Department of Mechanical and Aerospace Engineering, Gainesville, FL 32611-6250, United States;2. Leibniz-Institut für Analytische Wissenschaften (ISAS), Bunsen-Kirchhoff-Strasse 11, 44139 Dortmund, Germany;3. Federal Institute for Materials Research and Testing (BAM), Department 1: Analytical Chemistry and Reference Materials, Richard-Willstaetter-Strasse 11, 12489 Berlin, Germany |
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| Abstract: | Photoemission electron attachment ion mobility spectrometry (PE-EA-IMS), with a source of photoelectrons induced by vacuum ultraviolet radiation on a metal surface, has been developed to study electron attachment reaction at atmospheric pressure using nitrogen as the buffer gas. Based on the negative ion mobility spectra, the rate constants for electron attachment to tetrachloromethane and chloroform were measured at ambient temperature as a function of the average electron energy in the range from 0.29 to 0.96 eV. The experimental results are in good agreement with the data reported in the literature. |
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