Nano- and micro-fabrications of polystyrene having atactic and syndiotactic structures using focused ion beams lithography |
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| Authors: | Akihiro Oshima Satoshi Okubo Tomoko Gowa Oyama Masakazu Washio Seiichi Tagawa |
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| Affiliation: | 1. The Institute of Scientific and Industrial Research (ISIR), Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan;2. Research Institute for Science and Engineering (RISE), Waseda University, 3-4-1, Okubo, Shinjuku 169-8555, Japan;1. Radiation & Photochemistry Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400 085, India;2. Department of Chemistry, School of Science, Tokai University, Hiratsuka-shi, Kanagawa 259-1292, Japan;1. V. V. Voevodsky Institute of Chemical Kinetics and Combustion, Siberian Branch of the Russian Academy of Sciences, 630090 Novosibirsk, Russian Federation;2. Novosibirsk State University, 630090 Novosibirsk, Russian Federation;3. N. N. Vorozhtsov Novosibirsk Institute of Organic Chemistry, Siberian Branch of the Russian Academy of Sciences, 630090 Novosibirsk, Russian Federation;4. Novosibirsk State Technical University, 630073 Novosibirsk, Russian Federation;5. A. V. Nikolaev Institute of Inorganic Chemistry, Siberian Branch of the Russian Academy of Sciences, 630090 Novosibirsk, Russian Federation;1. Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China;2. University of Chinese Academy of Science, Beijing 100049, China;1. Department of Mechanical Engineering, Tokyo Denki University, 5 Senjyu Asahi-cho, Adachi-ku, Tokyo 120-8551, Japan;2. Department of Mechanical and Control Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8552, Japan;1. Centre of Radiation Chemistry and Technology, Institute of Nuclear Chemistry and Technology, Dorodna 16, 03-195 Warsaw, Poland;2. Departamento de Química Orgánica y Fisicoquímica, Facultad de Ciencias Químicas y Farmacéuticas, Universidad de Chile, Casilla 223, Santiago 1, Chile;3. Departamento de Química Orgánica, Facultad de Química, Pontificia Universidad Católica de Chile, Casilla 306, Correo 22, Santiago, Chile |
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| Abstract: | Micro- and nano-fabrications of polystyrene (PS) having the atactic and syndiotactic structures were carried out with direct maskless etching using focused ion beam (FIB). Micro- and nano-scale structures were obtained with selective beam and material conditions avoiding the beam-heating and charge-up effects. The etching rates were different between atactic and syndiotactic PS. The rate of fabrication for syndiotactic PS shows higher than that of atactic one. Moreover, the direct etching was influenced by the molecular weight. The etching rate for the lower molecular weight became the faster. The FIB direct etching proceeds through the two steps (decomposition and desorption (outgas)). Both decomposition and desorption are influenced by both conformation (morphology) and configuration (stereoregularity). Furthermore, the beam profiles and fluence play the important roles to perform the nano-fabrication of PS. |
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