Surface fluorination of paper in CF4-RF plasma environments |
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Authors: | HT Sahin S Manolache RA Young F Denes |
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Institution: | (1) Center for Plasma-Aided Manufacturing, University of Wisconsin, 1410 Engineering Dr., Room 101, Madison, 53706, USA |
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Abstract: | Plasma-based technologies are an exciting alternative for cellulose andpaper modification. Barrier coatings and surface functionalization of celluloseenhances properties and creates new possibilities for cellulose-based products.A parallel plate radio frequency (RF)-plasma reactor was used to modify papersubstrates under discharge parameters such as power, time and pressure. Carbontetrafluoride RF-plasma treatment of paper caused intense fluorination and itwas demonstrated that the fluorination reaction mechanisms can be controlled bythe external plasma parameters. Fluorine contents as high as 51.3% (contactangle=147°) were obtained for the treated cellulose. It was shown that eventreatment times as low as 30 s can generate relative surface fluorineatomic concentrations as high as 30%. High resolution ESCA and ATR-FTIRanalysisindicated covalently bound CFx functional groups with CF4treatment. It was found that under certain experimental conditionssuper-hydrophobic paper surfaces are created by combining the high surfacefluorine atomic concentrations with specific plasma-generated surfacetopographies. |
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Keywords: | CF4-plasma Fluorinated paper Hydrophobic layer Special papers Surface plasma treatment |
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