Functionalized block copolymers for preparation of reactive self‐assembled surface patterns |
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Authors: | Jan Stadermann Maria Riedel Hartmut Komber Frank Simon Brigitte Voit |
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Institution: | 1. Leibniz‐Institut für Polymerforschung Dresden e.V., Hohe Strasse 6, 01069 Dresden, Germany;2. Technische Universit?t Dresden, 01062 Dresden, Chemistry Department, Chair Organic Chemistry of Polymers, 01062 Dresden, Germany |
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Abstract: | Two phase separating block copolymers equipped with functional groups (acid and alkyne) were synthesized via reversible addition‐fragmentation chain transfer (RAFT) polymerization. Thin films of these materials were prepared and examined with regard to surface morphology, surface composition, and film stability. Self‐assembled structures with domain sizes of about 40 nm were detected through atomik force microscopy (AFM) analysis while X‐ray photoelectron spectroscopy measurements revealed a balanced surface exposure of the two segregated phases. Thus, reactive groups being present in both phases are specifically provided within nanoscopic surface areas. The films showed good stability on exposure to various solvents but the self‐organized surface patterns were only resistant toward ethanol. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011 |
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Keywords: | block copolymer functionalized block copolymers polymer films polymer surfaces nanostructures RAFT polymerization self‐assembly thin films |
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