Facile synthesis and responsive behavior of PDMS‐b‐PEG diblock copolymer brushes via photoinitiated “thiol‐ene” click reaction |
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| Authors: | Muquan Yang Jun Mao Wei Nie Zhixin Dong Dapeng Wang Ziliang Zhao Xiangling Ji |
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| Institution: | State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, and Graduate School of the Chinese Academy of Sciences, Changchun 130022, People's Republic of China |
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| Abstract: | We present herein a mild and rapid method to create diblock copolymer brushes on a silicon surface via photoinitiated “thiol‐ene” click reaction. The silicon surface was modified with 3‐mercaptopropyltrimethoxysilane (MPTMS) self‐assembled monolayer. Then, a mixture of divinyl‐terminated polydimethylsiloxane (PDMS) and photoinitiator was spin‐coated on the MPTMS surface and exposed to UV‐light. Thereafter, a mixture of thiol‐terminated polyethylene glycol (PEG) and photoinitiator were spin‐coated on the vinyl‐terminated PDMS‐treated surface, and the sequent photopolymerization was carried out under UV‐irradiation. The MPTMS, PDMS, and PEG layers were carefully identified by X‐ray photoelectron spectroscopy, atomic force microscopy, ellipsometry, and water contact angle measurements. The thickness of the polydimethylsiloxane‐block‐poly(ethylene glycol) (PDMS‐b‐PEG) diblock copolymer brush could be controlled by the irradiation time. The responsive behavior of diblock copolymer brushes treated in different solvents was also discussed. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2012 |
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| Keywords: | diblock copolymer brush diblock copolymers photoinitiate responsive spin‐coating stimuli‐sensitive polymers thiol‐ene chemistry |
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