Design and properties analysis of multi-layer dielectric used in pulse compressor gratings |
| |
Authors: | Weijin Kong Zicai Shen Jian Shen Jianda Shao Zhengxiu Fan |
| |
Affiliation: | aShanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, PO Box 800-211, Shanghai 201800, PR China;bGraduate School of Chinese Academy of Sciences, Beijing 100864, PR China |
| |
Abstract: | Used in chirped-pulse amplification system and based on multi-layer thin film stack, pulse compressor gratings (PCG) are etched by ion-beam and holographic techniques. Diffraction efficiency and laser-induced damage threshold rely on the structural parameters of gratings. On the other hand, they depend greatly on the design of multi-layer. A theoretic design is given for dielectric multi-layer, which is exposed at 413.1 nm and used at 1053 nm. The influences of coating design on optical characters are described in detail. The analysis shows that a coating stack of H3L (H2L)9H0.5L2.01H meets the specifications of PCG well. And there is good agreement of transmission between experimental and the theoretic design. |
| |
Keywords: | Pulse compressor gratings Multi-layer dielectric Optic properties analysis Optic film stack design |
本文献已被 ScienceDirect 等数据库收录! |