A mechanism of changes in the electron work function upon water chemisorption on a Si(100) surface

Based on an analysis of observed changes, experimentally obtained by the methods of thermal and radiation processing, in the electron work function (EWF) of a monocrystalline silicon (100) surface upon water chemisorption, a physical mechanism associated with the concept of the energy action of the coherent phase of sorbed water on a surface is proposed for the decrease and increase in the EWF.