| 光刻与光刻胶的研究与发展 |
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| 引用本文： | 洪啸吟. 光刻与光刻胶的研究与发展[J]. 高分子通报, 1993, 0(3): 129-133,185 |
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| 作者姓名： | 洪啸吟 |
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| 作者单位： | 清华大学化学系 北京，100084 |
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| 摘 要： | 本文介绍用于超大规模集成电路的光刻技术及其光刻胶,包括化学增值型光刻胶和无显影气相光刻胶等的研究进展和发展趋势.
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| 关 键 词： | 光刻 光刻胶 光敏聚合物 |
Progress and Development Trend of Photolithography and Photoresist |
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| Hong Xiaoyin Chemistry Department,Tsinghua University,Beijing. Progress and Development Trend of Photolithography and Photoresist[J]. Polymer Bulletin, 1993, 0(3): 129-133,185 |
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| Authors: | Hong Xiaoyin Chemistry Department Tsinghua University Beijing |
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| Affiliation: | Hong Xiaoyin Chemistry Department,Tsinghua University,Beijing 100084 |
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| Abstract: | This Paper reviews the recent progress and development trend of photolithography and photoresist for ULSI, including Chemical amplified Resists, Development-free vapor photolithography, Phase shift method and so on. |
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| Keywords: | Photolithography Photoresist Photopolymer |
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