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重掺杂发射区中禁带宽度和少子复合寿命的确定方法
引用本文:郑茳,冯耀兰.重掺杂发射区中禁带宽度和少子复合寿命的确定方法[J].电子与信息学报,1989,11(4):439-443.
作者姓名:郑茳  冯耀兰
作者单位:南京工学院微电子中心 南京 (郑茳),南京工学院微电子中心 南京(冯耀兰)
摘    要:禁带宽度和少子复合寿命是硅晶体管发射区中重要的物理参数。本文利用p-n结反向扩散电流的温度特性和借助于线性外推法,提出了一种确定绝对零度时禁带宽度的新方法。由于发射区重掺杂,本文考虑了载流子的费米-狄拉克统计分布。提出了确定发射区中少子复合寿命的方法。该方法简便实用。

关 键 词:重掺杂发射区    禁带宽度    少子复合寿命
收稿时间:1987-7-17
修稿时间:1988-3-31

A NEW METHOD FOR DETERMINATION OF ENERGY GAP AND MINORITY-CARRIER RECOMBINATION LIFETIME IN HIGHLY DOPED EMITTER
Zhen Jiang,Feng Yaolan.A NEW METHOD FOR DETERMINATION OF ENERGY GAP AND MINORITY-CARRIER RECOMBINATION LIFETIME IN HIGHLY DOPED EMITTER[J].Journal of Electronics & Information Technology,1989,11(4):439-443.
Authors:Zhen Jiang  Feng Yaolan
Institution:Microelectronics Center of Nanjing Institute of Technology, Nanjing
Abstract:Energy gap and minority-carrier recombination lifetime are important physical parameters in the emitter of silicon transistor. Using temperature characteristics obtained from the reverse diffusion current of p-n junction and by means of linear extrapolation, a new method for determination of the energy gap at OK is presented. Based on the carrier Fermi-Dirac statistic distribution, a method for determination of minority-carrier recombination lifetime in highly doped emitter is presented. This test method is simple and can be used in practice.
Keywords:Highly doped emitter  Energy gap  Minority-carrier recombination lifetime
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