Deposition of Ethylene-Hexafluoropropene Gradient Plasma-Copolymer Using Dielectric Barrier Discharge Reactor at Atmospheric Pressure: Application to Release Coatings on Pressure-Sensitive Tape |
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Authors: | Tanaka Kunihito Kogoma Masuhiro |
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Affiliation: | (1) Department of Chemistry, Faculty of Science and Technology, Sophia University, 7-1 Kioi-cho, Chiyoda-ku, Tokyo, 102-8554, Japan |
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Abstract: | Plasma-polymerized hexafluoropropene (PPHFP) film deposited using a dielectric barrier discharge reactor at atmospheric pressure had low enough adhesive strength, 22.2 Nm–1, for use as a release coating of pressure-sensitive adhesive tapes, but the bond strength between PPHFP film and a poly (ethylene terephthalate) (PET) substrate film was slightly weak: some part of the PPHFP deposits could be peeled from the PET substrate. Since the XPS results indicated that the bond strength between plasma-polymerized ethylene (PPE) film and PET substrate was strong enough, we tried to deposit PPE and plasma-polymerized ethylene - hexafluoropropene gradient plasma-copolymer between the PET substrate and the PPHFP film. This multi-layer film (MLF) had low enough adhesive strength, 36.6 Nm–1, for use as the release coating; this value was near that of a control sample, Teflon sheet, 21.6 Nm–1. Moreover, the bond strength between MLF and PET substrate became stronger than that between PPHFP and PET films. |
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Keywords: | Hexafluoropropene atmospheric pressure glow plasma adhesive plasma processing and deposition |
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