| 大视场投影光刻物镜的畸变特性检测 |
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| 引用本文： | 马韬,沈亦兵. 大视场投影光刻物镜的畸变特性检测[J]. 光子学报, 2005, 34(1): 46-49 |
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| 作者姓名： | 马韬 沈亦兵 |
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| 作者单位： | 浙江大学现代光学仪器国家重点实验室,杭州,310027;浙江大学现代光学仪器国家重点实验室,杭州,310027 |
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| 摘 要： | 畸变特性是光刻物镜的关键指标，目前少有报道，提出了一种大视场投影光刻物镜畸变测量原理，测量系统和测量数据的处理方法. 利用该装置对研制的口径6英寸，分辨率3 μm的物镜进行了测量，得出该物镜在全视场的畸变值小于2.0 μm.
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| 关 键 词： | 光刻 畸变检测 |
| 收稿时间： | 2003-10-29 |
| 修稿时间： | 2003-10-29 |
Distortion Detect of Large Field Projection Lithography Lens |
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| Affiliation: | (Zhejiang Univercity State Key Laboratory of Optical Instrument, Hangzhou 310027) |
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| Abstract: | Distortion is the key index of lithography lens system, but there is no much reports about it. This paper presents a new theory and system about distortion detect, and a new method about how to process the detected data. A new 6-inch dimension, 3 μm resolution large field projection lithography lens was detected with this system and the results is that the distortion of this lithography lens is less than 2.0 μm in all field. |
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| Keywords: | Lithography Technology Distortion Detect |
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