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Molecular Precursors for the Phase‐Change Material Germanium‐Antimony‐Telluride,Ge2Sb2Te5 (GST)
Authors:Nicole Harmgarth  Florian Zörner  Phil Liebing  Edmund P. Burte  Mindaugas Silinskas  Felix Engelhardt  Frank T. Edelmann
Affiliation:1. Chemisches Institut der Otto‐von‐Guericke‐Universit?t Magdeburg, Magdeburg, Germany;2. Laboratorium für Anorganische Chemie, ETH Zürich, Zürich, Switzerland;3. Institut für Mikro‐ und Sensorsysteme, Otto‐von‐Guericke‐Universit?t, Magdeburg, Germany;4. http://www.ich.ovgu.de/Lehrstühle/Anorganische+Chemie.html+49‐391‐67‐12933
Abstract:This review provides an overview of the precursor chemistry that has been developed around the phase‐change material germanium‐antimony‐telluride, Ge2Sb2Te5 (GST). Thin films of GST can be deposited by employing either chemical vapor deposition (CVD) or atomic layer deposition (ALD) techniques. In both cases, the success of the layer deposition crucially depends on the proper choice of suitable molecular precursors. Previously reported processes mainly relied on simple alkoxides, alkyls, amides and halides of germanium, antimony, and tellurium. More sophisticated precursor design provided a number of promising new aziridinides and guanidinates.
Keywords:Germanium‐antimony‐telluride  Germanium  Antimony  Tellurium  Atomic layer deposition  Chemical vapor deposition
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