Experimental analysis of current conduction through thermally grown SiO2 on thick epitaxial 4H-SiC employing Poole-Frenkel mechanism

Electrical properties of SiO₂ grown on the Si-face of the epitaxial 4H-SiC substrate by wet thermal oxidation technique have been experimentally investigated in metal oxide-silicon carbide (MOSiC) structure with varying oxide thicknesses employing Poole-Frenkel (P-F) conduction mechanism. The quality of SiO₂ with increasing thickness in MOSiC structure has been analysed on the basis of variation in multiple oxide traps due to effective P-F conduction range. Validity of Poole-Frenkel conduction is established quantitatively employing electric field and the oxide thickness using forward I–V characteristics across MOSiC structures. From P-F conduction plot (ln(J/E) vs. E ^1/2), it is revealed that Poole-Frenkel conduction retains its validation after a fixed electric field range. The experimental methodology adopted is useful for the characterization of oxide films grown on 4H-SiC substrate.