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用Pendell?sung条纹研究硅单晶中微缺陷
引用本文:李明,麦振洪,崔树范. 用Pendell?sung条纹研究硅单晶中微缺陷[J]. 物理学报, 1994, 43(1): 78-83
作者姓名:李明  麦振洪  崔树范
作者单位:中国科学院物理研究所
基金项目:国家自然科学基金资助的项目.
摘    要:以X射线衍射统计动力学为基础,讨论了一种用X射线截面形貌图测定静态Debye-Waller因子的方法.通过仔细分析截面形貌图中Pendell?sung干涉条纹振荡周期和强度的变化,得到了经热处理后的CZ硅和MCZ硅单晶样品的静态Debye-Waller因子,并求得样品中氧沉淀的浓度和平均尺寸.这种定量化的研究方法为揭示晶体中微缺陷的性质及形成机理提供了新途径.关键词

收稿时间:1993-03-29

CHARACTERIZATION OF MICRO-DEFECTS IN SILICON SINGLE CRYSTALS BY ANALYZING THE PENDELL?SUNG FRINGES
LI MING,MAI ZHEN-HONG and CUI SHU-PAN. CHARACTERIZATION OF MICRO-DEFECTS IN SILICON SINGLE CRYSTALS BY ANALYZING THE PENDELL?SUNG FRINGES[J]. Acta Physica Sinica, 1994, 43(1): 78-83
Authors:LI MING  MAI ZHEN-HONG  CUI SHU-PAN
Abstract:Based on the statistical theory of X-ray dynamical diffraction, a method to obtain the static Debye-Waller facter from section topographs is described. By analyzing the intensity distribution of the Pendelldsung fringes in the X-ray diffraction topograghs for heat treated CZ and MCZ silicon single crystals, the number density and the size of the oxygen precipitates which are smaller than X-ray topographic resolution are estimated. This quantitative analysis method provides a new means of studying the micro-defects.
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