发射光谱法研究微波增强微秒级脉冲辉光放电中样品原子的 …

利用自制微波增强微秒级脉中辉光放电装置，研究了黄铜样品原子的激发和扩散过程，结果表明，当放电气压低于１８０Ｐａ时，微波等离子体与辉光放电很好的耦合，当气压大于２００Ｐａ时，由于样品原子分别受到脉冲辉光放电与微波等离子体的激发，同一条共振线出现了在时间上独立的两个发射峰。利用两发射峰之间的关系可以计算出该工作条件下铜原子和锌原子的扩散速度分别约为１５０和１２９ｍ／ｓ，而辉光放电的最强激发点的约离溅射

Study of the excitation and diffusion processes of sample atoms in a microwave boosted microsecond-pulse glow discharge source with optical emission spectrometry]

The excitation and diffusion processes of brass sample atoms in a GD-MIP tandem source have been studied with a home-made MIP boosted micros-pulse GD device. Experimental results show that under relatively low discharge pressure (< 180Pa), the micros-pulse GD can couple quite well with MIP and emit strong radiation of analytical lines. When the GD source is operated under a pressure higher than 200Pa, two emission peaks appear independently in time for a given resonant atomic line, because sample atoms are structurally excited separately first by the micros-pulse GD and then by the MIP. According to the two emission peaks, the diffusing velocities of copper atoms and zinc atoms can be calculated, yielding values of 150 and 129m/s, respectively, and the most excited area in-the micros-pulse GD is about 1.94-2.25mm away from the sputtering surface of the sample cathode. The effects of discharge parameters on emission intensities have been also investigated.