首页 | 本学科首页   官方微博 | 高级检索  
     

光致变色二芳基乙烯抗疲劳特性实验研究
引用本文:陈利菊,姚保利,韩俊鹤,郜鹏,陈懿,王英利,雷铭. 光致变色二芳基乙烯抗疲劳特性实验研究[J]. 光子学报, 2009, 38(5): 1182-1186
作者姓名:陈利菊  姚保利  韩俊鹤  郜鹏  陈懿  王英利  雷铭
作者单位:中国科学院西安光学精密机械研究所,瞬态光学与光子技术国家重点实验室,西安,710119;中国科学院研究生院,北京,100049;中国科学院西安光学精密机械研究所,瞬态光学与光子技术国家重点实验室,西安,710119;中国科学院物理化学技术研究所,北京,100080
摘    要:提出了一种简单直观的方法研究光致变色材料二芳基乙烯/PMMA膜的抗疲劳特性.通过测量样品在漂白和呈色过程中探测光的透过率,分析该样品光致变色过程的最佳曝光量,在此基础上测量样品的抗疲劳特性.结果显示:在漂白和呈色过程中,激发红光和紫光的最佳曝光量为分别为1 900 J/cm2和600 mJ/cm2,表明该材料对红光不敏感,对紫光比较敏感.定义漂白-呈色过程中,探测光透过率稳定值差下降为第一次循环的50%时样品已经疲劳.通过交替的漂白-呈色循环,测得这种二芳基乙烯材料的擦写次数为27次.

关 键 词:光致变色  二芳基乙烯  抗疲劳特性  漂白-呈色过程
收稿时间:2008-01-07
修稿时间:2008-02-26

Experimental Measurement of Fatigue Resistance of a Photochromic Diarylethene
CHEN Li-ju,YAO Bao-li,HAN Jun-he,GAO Peng,CHEN Yi,WANG Ying-li,LEI Ming. Experimental Measurement of Fatigue Resistance of a Photochromic Diarylethene[J]. Acta Photonica Sinica, 2009, 38(5): 1182-1186
Authors:CHEN Li-ju  YAO Bao-li  HAN Jun-he  GAO Peng  CHEN Yi  WANG Ying-li  LEI Ming
Affiliation:(1 State Key Laboratory of Transient Optics and Photonics,Xi′an Institute of Optics and Precision Mechanics,
Chinese Academy of Sciences,Xi′an 710119,China)
(2 Graduate University of Chinese Academy of Sciences,Beijing 100049,China)
(3 Technical Institute of Physics and Chemistry,Chinese Academy of Sciences,Beijing 100080,China)
Abstract:A simple and intuitionistic method was presented to measure the fatigue resistance of photochromic diarylethene/PMMA film.The optimal exposure was analyzed by measuring the transmission of diarylethene in the bleached and colored process,in basis of which fatigue resistance was measured.The results indicate that the best exposure of bleached and colored process are 1 900 J/cm2 and 600 mJ/cm2 respectively,which shows diarylethene is insensitive to red light and sensitive to purple light.The fatigue of the ma...
Keywords:Photochromic  Diarylethene  Fatigue resistance  Bleached-colored process
本文献已被 CNKI 维普 万方数据 等数据库收录!
点击此处可从《光子学报》浏览原始摘要信息
点击此处可从《光子学报》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号