Structure and optical damage resistance of Zn:Mn:Fe:LiNbO3 crystals |
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| Authors: | Xihe Zhen Qiang Li |
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| Institution: | a Department of Chemistry, Tsinghua University, Beijing 100084, PR China
b Department of Applied Chemistry, Harbin Institute of Technology, Harbin 150001, PR China |
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| Abstract: | The new non-volatile holographic storage materials, Zn:Mn:Fe:LiNbO3 crystals, were prepared by Czochralski technique. Their microstructure was measured and analyzed by infrared (IR) transmission spectra. The optical damage resistance of Zn:Mn:Fe:LiNbO3 crystals was characterized by the transmitted beam pattern distortion method. It increases remarkably when the concentration of ZnO is over a threshold concentration. Its value in Zn(7.0 mol%):Mn:Fe:LiNbO3 crystal is about three orders of magnitude higher that in Mn:Fe:LiNbO3 crystal. The photoinduced birefringence change was measured by the Sénarmont's method. It decreased with ZnO concentration increasing. The dependence of the defects on the optical damage resistance was discussed. |
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| Keywords: | Zn:Mn:Fe:LiNbO3 crystal Structure Optical damage resistance |
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