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Mechanism Study for Thermal/Electric Field Poling of Fused Silica
Authors:X.-M Lui and M.-D Zhang
Affiliation:(1) Department of Electronic Engineering, Tsinghua University, Beijing, 100084, People's Republic of China;(2) Department of Electronic Engineering, Southeast University, Nanjing, 210096, People's Republic of China
Abstract:On the basis of the experimental reports, the mechanism of the second-order susceptibility chi(2) for the thermal/electric field poling of fused silica is analyzed, and expressions for chi(2) are detailedly derived and numerically calculated for the first time. By comparison the theoretical value of chi(2) with the experiment results, we propose that the effective chi(2) is created via both the interaction of the intense electric field with the third-order susceptibility chi(3) and the dipole orientation. The theoretical results show that, in the differently applied voltage, the dipole orientation and chi(3) play different role in the formation of chi(2). This theory successfully explains some experiment results.
Keywords:fused silica  thermal/electric field poling  second-order nonlinearity  dipole
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