| 磁控溅射薄膜沉积速率的标定 |
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| 引用本文： | 陈海良,马明建.磁控溅射薄膜沉积速率的标定[J].大学物理实验,2010,23(2):4-6,18. |
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| 作者姓名： | 陈海良 马明建 |
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| 作者单位： | 燕山大学,河北,秦皇岛,066004 |
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| 摘 要： | 在不同的溅射功率和溅射时间下，使用磁控溅射设备制备了系列薄膜Si／Fe（P1W，T1s）和Si/Fe（P2W，T2s）／NiO（P3w，T3s）]10。利用小角X射线衍射测量了样品的衍射强度分布，并分别计算出了Fe和NiO在不同溅射功率下的沉积速率。实验结果表明，在测量范围内沉积速率与溅射功率之间存在线性关系。
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| 关 键 词： | 磁控溅射 小角x射线衍射 沉积速率 |
Determination of Magnetron Sputtering Films Deposition Rate |
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| CHEN Hai-liang,MA Ming-jian.Determination of Magnetron Sputtering Films Deposition Rate[J].Physical Experiment of College,2010,23(2):4-6,18. |
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| Authors: | CHEN Hai-liang MA Ming-jian |
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| Institution: | (Yanshan University, Hebei, Qinhuangdao 066004) |
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| Abstract: | Series films of Si/Fe（P1w,T1s） and Si/Fe（P2w,T2s）/NiO（P3w, T3s）]10 was doposited by magnetron sputtering device under different sputtering power and sputtering time. With the measurement of small angle X-ray diffraction,the Fe and NiO films deposition rate under different sputtering power were calculated. It＇s conclude that the deposition rate shows linearity with sputtering power within the measuring range. |
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| Keywords: | magnetron sputtering small angle X-ray diffraction deposition rate |
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