A surface sensitive optical method for the evaluation of processed ZnO: exploitation of LO phonon interaction |
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| Authors: | C. Harada H. Goto T. Minegishi T. Suzuki H. Makino M. W. Cho T. Yao |
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| Affiliation: | a Center for Interdisciplinary Research, Tohoku University, Aramaki, Aoba-ku, Sendai 980-8578, Japan;b Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan |
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| Abstract: | We report on a surface property of bulk ZnO crystals and an optical method to evaluate it. Bulk ZnO crystals have a damaged surface layer due to chemomechanical polishing. We prepared the ZnO crystals by etching, and evaluated the improvement of the surface by high-resolution X-ray diffraction (XRD) and photoluminescence (PL). In PL measurements, the relative intensity of the first order longitudinal optical phonon replica of free exciton (FX-1LO) to second order process (FX-2LO) was compared. The relative intensity becomes weak with increasing etched depth and finally saturates at the etched depth of 5 μm. This result agrees well with XRD results. |
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| Keywords: | ZnO Etching Surface property LO phonon |
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