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Preparation of Nanostructured Magnetic Films by the Plasma Jet Technique
Authors:Frantisek Fendrych  Ludek Kraus  Oleksandr Chayka  Peter Lobotka  Ivo Vavra  Jan Tous  Vaclav Studnicka  Zdenek Frait
Affiliation:(1)  Institute of Physics, ASCR, CZ-18221 Praha 8, Czech Republic, CZ;(2)  Institute of Electrical Engineering, SAS, SK-84239 Bratislava, Slovak Republic, SK
Abstract:Summary.  Magnetic films were prepared by the plasma jet technique from Fe, mumetal, and Fe/Hf or Fe/Ta nozzles. Two different plasma jet systems with different vacuum pumps were used to compare the quality of the produced films. The films prepared from a Fe nozzle in the two different equipments shows that oxygen in the residual atmosphere of the low vacuum reactor leads mainly to the formation of iron oxides. The Fe and mumetal films prepared in the high vacuum system contain only a very small amount of oxygen, as proved by chemical analysis and ferromagnetic resonance. The mumetal film, moreover, shows good soft magnetic properties and low magnetic damping. For the reactive plasma jet deposition of nanogranular Fe–Hf–O and Fe–Ta–O films, the low vacuum system was used. The films with higher oxygen content exhibit tunneling-type conductivity. In some films, superparamagnetic behaviour and spin-dependent tunneling magnetoresistance were observed. Received October 5, 2001. Accepted November 22, 2001
Keywords:.   Plasma jet   Magnetic films   Nanogranular materials   Tunneling magnetoresistance.
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