Ion-beam induced changes in magnetic and microstructural properties of thin iron films |
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Authors: | G A?Müller E?Carpene R?Gupta P?Schaaf K?Zhang Email author" target="_blank">K P?LiebEmail author |
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Institution: | 1.II. Physikalisches Institut and Sonderforschungsbereich 602, Universit?t G?ttingen,G?ttingen,Germany |
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Abstract: | Changes in magnetic and structural properties of 60–82 nm iron films induced
by heavy-ion implantation were studied using the magneto-optical Kerr
effect, M?ssbauer spectroscopy, Rutherford backscattering spectroscopy,
X-ray diffraction, and X-ray absorption fine structure. The influence of
ion-beam parameters (ion mass, fluence) and of sample parameters (external
magnetic field and stress during implantation) were investigated. The Fe
films, some of them containing a thin 57Fe marker layer for
M?ssbauer spectroscopy, were deposited on Si(100) substrates, by
electron-beam and effusion-cell evaporation. The films were irradiated with
20Ne, 56Fe, 86Kr and 132Xe ions at energies chosen so
that the implantation profiles peaked near the middle of the Fe films. The
as-deposited films were magnetically isotropic and had a high coercivity.
After ion implantation, the coercivity decreased and magnetic anisotropy
developed. Both changes correlated with a decrease in the internal film
stress. External mechanical stress applied during the irradiation had hardly
any influence on the magnetic texture, opposite to an external magnetic
field applied during or before ion implantation. The results are compared
with those obtained for ion-irradiated polycrystalline Ni films and
epitaxial Fe films and discussed with respect to the role of
radiation-induced extended defects as pinning centers. |
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