A new fabrication technique for photonic crystals: Nanolithography combined with alternating-layer deposition |
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Authors: | Kuramochi E. Notomi M. Kawashima T. Takahashi J. Takahashi C. Tamamura T. Kawakami S. |
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Affiliation: | (1) NTT Basic Research Laboratories, 3-1 Morinosato Wakamiya, Atsugi-shi, 243-0198, Japan;(2) New Industry Creation Hatchery Center, Tohoku University, Aramaki-Aza-Aoba, Aoba-ku, Sendai, 980-8579, Japan;(3) NTT Telecommunications Energy Laboratories, 3-1 Morinosato Wakamiya, Atsugi-shi, 243-0198, Japan;(4) Present address: NTT Electronics Corporation, 3-1 Morinosato Wakamiya, Atsugi-shi, 243-0198, Japan |
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Abstract: | We propose two photonic crystal structures that can be created by combining nanolithography with alternating-layer deposition. Photonic band calculations suggest that a drilled alternating-layer photonic crystal combining two-dimensional (2D) alternating multilayers and an array of vertically drilled holes may achieve a full photonic bandgap. In addition, a 3D/2D/3D cross-dimensional photonic crystal, which sandwiches a 2D photonic crystal slab between three-dimensional (3D) alternating-layer photonic crystals, should provide better vertical confinement of light than a conventional index guiding slab. Fabrication techniques based on existing technologies (electron beam lithography, bias sputtering, and low-pressure ECR etching) require very few process steps. Our preliminary fabrication suggests that, by refining these technologies, we will be able to realize photonic crystals. |
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Keywords: | alternating-layer deposition ECR etching electron beam lithography photonic bandgap photonic crystal |
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