Competition between dissolution and redox reactions in the electrochemistry ofn-GaP |
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Authors: | K. -H. Heckner G. Majoros A. Kraft R. Landsberg |
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Affiliation: | (1) Institut für Physikalische and Theoretische Chemie, Humboldt-Universität Berlin, Bunsenstr. 1, 10117 Berlin, (Germany) |
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Abstract: | The lowering of the photocorrosion ofn-GaP in 1M KOH in the presence of several redox systems was investigated using neutron activation analysis. After thermal neutron irradiation of GaP and annihilation of irradiation induced defects by annealing processes the photodissolution was investigated by measuring the activity of the corresponding electrolyte solutions. The dependence of the stabilization of the photoelectrode on concentration and redox potential of the reduced form of the redox couples I–, Fe (CN)64– and SO32– was measured. It was found that the stabilization is growing with growing concentration and lowering of the redox potential of the corresponding redox couple. |
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